9780273730989
 

Extreme Ultraviolet Lithography

All Categories > Physics > Biophotonics

Authors: Banqiu Wu, Ajay Kumar
  • ISBN: 9780071549189
  • Price: LE 160.00
  • Special Offer Price: LE 128.00
  • Number Of Pages: 482
  • Edition: 1 Edition
  • Publication Date: 2009
  • Categories Biophotonics  
+ Add To Cart
In Stock

Description:

Master Extreme Ultraviolet Lithography Techniques

Produce high-density, ultrafast microchips using the latest EUVL methods. Written by industry experts, Extreme Ultraviolet Lithography details the equipment, materials, and procedures required to radically extend fabrication capabilities to wavelengths of 32 nanometers and below. Work with masks and resists, configure high-reflectivity mirrors, overcome power and thermal challenges, enhance resolution, and minimize wasted energy. You will also learn how to use Mo/Si deposition technology, fine-tune performance, and optimize cost of ownership.

Design EUVL-ready photomasks, resist layers, and source-collector modules

Assemble optical components, mirrors, microsteppers, and scanners

Harness laser-produced and discharge pulse plasma sources

Enhance resolution using proximity correction and phase-shift

Generate modified illumination using holographic elements

Measure critical dimensions using metrology and scatterometry

Deploy stable Mo/Si coatings and high-sensitivity multilayers

Handle mask defects, layer imperfections, and thermal instabilities.